Modeling and characterization of CFET transistors for enhanced electrical performance
Complementary Field Effect Transistors (CFETs) represent a new generation of vertically stacked CMOS devices, offering a promising path to continue transistor miniaturization and to meet the requirements of high-performance computing.
The objective of this PhD work is to study and optimize the strain engineering of the transistor channel in order to enhance carrier mobility and improve the overall electrical performance of CFET devices. The work will combine numerical modeling of technological processes using finite element methods with experimental characterization of crystalline deformation through transmission electron microscopy coupled with precession electron diffraction (TEM-PED).
The modeling activity will focus on predicting strain distributions and their impact on electrical properties, while accurately accounting for the complexity of the technological stacks and critical fabrication steps such as epitaxy. In parallel, the experimental work will aim to quantify strain fields using TEM-PED and to compare these results with simulation outputs.
This research will contribute to the development of dedicated modeling tools and advanced characterization methodologies adapted to CFET architectures, with the goal of improving spatial resolution, measurement reproducibility, and the overall understanding of strain mechanisms in next-generation transistors.
Bayesian Neural Inference Using Ferroelectric Memory Transistors
An increasing number of safety-critical systems now rely on artificial intelligence functions that must operate under strict energy constraints and in environments characterized by data scarcity and high uncertainty. However, conventional deterministic AI approaches provide only point estimates and lack principled uncertainty quantification, which can lead to unreliable or unsafe decisions in real-world deployment.
This PhD is positioned within the emerging field of Bayesian electronics, which aims to implement probabilistic inference directly in hardware by leveraging the intrinsic stochasticity of nanoscale devices to represent and manipulate probability distributions. While memristive devices have previously been explored for Bayesian inference, their limited endurance and high programming energy remain critical bottlenecks for on-chip learning.
The objective of this thesis is to investigate ferroelectric field-effect memory transistors (FeMFETs) as building blocks for hardware Bayesian neural networks. The work will involve characterizing and modeling the exploitable ferroelectric randomness for sampling and probabilistic weight updates, designing Bayesian neuron and synapse architectures based on FeMFETs, and evaluating their robustness, energy efficiency, and system-level performance for safety-critical inference under uncertainty.
In situ study of the impact of the electric field on the properties of chalcogenide materials
Chalcogenide materials (PCM, OTS, NL, TE, FESO, etc.) are the basis of the most innovative concepts in microelectronics, from PCM memories to the new neuromorphic and spinorbitronic devices (FESO, SOT-RAM, etc.). Part of their operation relies on out-of-equilibrium physics induced by the electronic excitation resulting from the application of an intense electric field. The aim of this thesis is to measure experimentally on chalcogenide thin films the effects induced by the intense electric field on the atomic structure and electronic properties of the material with femtosecond (fs) time resolution. The 'in-operando' conditions of the devices will be reproduced using a THz fs pulse to generate electric fields of the order of a few MV/cm. The induced changes will then be probed using various in situ diagnostic methods (optical spectroscopy or x-ray diffraction and/or ARPES). The results will be compared with ab initio simulations using a state-of-the-art method developed with the University of Liège. Ultimately, the ability to predict the response of different chalcogenide alloys on time scales fs under extreme field conditions will make it possible to optimise the composition and performance of the materials (e- switch effect, electromigration of species under field conditions, etc.), while providing an understanding of the underlying fundamental mechanisms linking electronic excitation, evolution and the properties of the chalcogenide alloys.
Electrical characterization and optimization of III-V HBT on Si for 6G and datacom applications
As digital content demand surges, 6G systems face major challenges, particularly in developing power amplifiers for Sub-THz frequencies. These frequencies promise ultra-high data rates but push the limits of current silicon technology. In AI datacenters, optical communication between GPUs is a must to reduce the total energy usage, compared to classical wiring. The highest speed devices are then needed in photodetectors & lasers’ electrical drivers. InP-based Heterojunction Bipolar Transistors (HBTs) on large silicon substrates offer a promising solution, combining high-speed performance with minimal system losses. This technology comes with the challenges of integrating III-V layers with CMOS-compatible processes while allowing promising new device architectures, for both electrical parasitics reduction and self-heating management.
This PhD program aims to guide Leti’s III-V HBT on Si developments to optimize the device architecture and increase the RF performance.
In this program the student will:
Perform electrical characterization of various device geometries and technological splits through DC and RF measurements such as IV, thermal analysis, S-parameters and possibly Load-Pull.
Simulate key parasitics and new device architectures to understand device limitations
Collaborate closely with process engineers to link electrical results with fabrication choices and guide device optimization
New generation of 3D ferroelectric memories (FeRAM) with fully BEOL-integrated 1T-1C bitcells
Ferroelectric memories of the FeRAM 1T-1C type based on HZO have the potential to replace the last levels of Cache. CEA-Leti is at the state of the art in this field at the 22nm node [1], with 1T-1C bitcells already denser than those of SRAM. In this approach, the selection transistor (1T) is a front-end transistor, and the three-dimensional ferroelectric capacitor (1C) is integrated in the back-end.
It has been shown by Micron [2] that the use of a three-dimensional back-end transistor made of polycrystalline silicon allows 1/ to densify the bitcell, 2/ to stack several levels of FeRAM, and 3/ to use the CMOS under the arrays for control logic (CMOS Under Array - CuA).
The objective of this thesis is to evaluate other types of selectors, in particular vertical amorphous oxide semiconductor field-effect transistors (AOSFETs) integrated in the back-end, for the new generations of FeRAM memories. The characteristics of these back-end transistors [3] (low Ioff, low Ion, low Vth) should offer significant advantages for the operation of FeRAM memory arrays at very low voltages (< 1V) while allowing the integration of very dense 1T-1C bitcells entirely in the back-end.
The thesis will primarily be oriented towards DTCO (Design Technology Co-Optimization) to propose dense bitcells using realistic integration schemes. It will also be able to rely on recent experimental results obtained at CEA, both on AOSFETs and on 3D ferroelectric capacitors [1], with a view to first silicon demonstrations.
[1] S. Martin et al., IEDM 2024; [2] N. Ramaswamy et al., IEDM 2023; [3] S. Deng et al., VLSI 2025
Advanced SOI technologies: Design, Integration & Electrical characterization
Join CEA-Leti to develop a technological module (localized ground plane) for various applications (EU FDSOI, RF devices, ultra-miniaturized pixels, cryo-RF and quantum).
This PhD topic is challenging since you will design step by step a specific module and test it electrically. Our team will support you technically and scientifically to conduct this work. Some data are already available and waiting for your analysis.
During this PhD, you will have the opportunity to learn how a module/device is designed step by steps:
From the idea (simulation, bibliography)
Material & Processes understanding (bonding, CMP)
Integration & cleanroom fabrication management
Characterization (physical & electrical: mobility, interface traps)
Valorization (presentations, article)
Integration of security functions for imagers: encryption, watermarking using compact functions close to the sensor
Illicit uses of images have dramatically risen with deepfake content manipulation or unauthorized access. Securing images at their source i.e., at the image sensor level, is key to addressing the challenges of this field of cybersecurity. The "trusted imagers" concept addresses the need to ensure image security, authentication, and encryption starting at the point of acquisition.
Building on our initial research, notably regarding the in-situ generation of keys, your PhD thesis will focus on finding innovative solutions to integrate security functions into image sensors with the challenge of meeting the requirements of low power consumption and compact integrated architecture, while keeping a high level of security. After an initial phase aiming at the development of the skills specific to the thesis, and depending on your background and interests, your work will involve:
- Developing encryption and/or watermarking algorithms in Python to evaluate their complexity, then proposing compact versions compatible with integration into image sensors.
- Evaluating the impact of algorithmic choices and hardware implementation on image quality.
- Designing and validating hardware architectures that implement the algorithms.
- Designing the integrated circuits implementing these functions.
With the ultimate goal of fabricating an integrated circuit, the work will be conducted at CEA-Leti, using professional IC design tools and software development environments.
Development of vertical GaN power transistors gate module
This PhD topic offers a unique opportunity to enhance your skills in GaN power devices and develop cutting-edge architectures. You’ll work alongside a multidisciplinary team specializing in material engineering, characterization, device simulation, and electrical measurements. If you’re eager to innovate, expand your knowledge, and tackle state-of-the-art challenges, this position is a valuable asset to your career!
Vertical GaN power components are highly promising for applications beyond the kV range and are therefore extensively studied worldwide. Transistors with a 'trench MOSFET' architecture have been demonstrated in the state-of-the-art with very encouraging results. The gate stack of these devices is a crucial element as it directly impacts their on-state resistance, threshold voltage, and the control signal to be applied in a power converter. The proposed study will focus on developing innovative gate stacks that can withstand high gate voltages while maintaining state-of-the-art threshold voltage and channel mobility with minimal gate dielectric trapping. The work will involve studying the impact of process parameters on electrical characteristics. Special attention will be given to optimizing the gate geometry through TCAD simulations to study how its shape impacts on-state and breakdown. Identified improvements will be integrated to the devices fabricated on our 200mm GaN power devices line. The work will take place within the power devices lab and will be supported by several ongoing projects.
Study of Etching Mechanisms in Dielectric Materials: Application to Low Global Warming Potential Gases
Interconnection levels (Back-End Of Line, or BEOL) in microelectronics enable the connection of transistors to achieve the desired device functionalities. The fabrication of these levels relies on lithography and plasma etching processes. Plasma dry etching is a key technique in the manufacturing of microelectronic devices, as it allows the precise definition of structures at the nanometer scale. This process involves several major challenges, including stringent control of etch profiles, critical dimensions of the patterns, and the assurance of selectivity between different materials. Beyond these technical aspects, plasma etching also raises significant environmental concerns. Indeed, the gases used in these processes, such as fluorocarbons, are often greenhouse gases with very high global warming potential (GWP).
The objective is therefore twofold: to reduce the carbon footprint of these processes while maintaining, or even improving, the critical post-etch performance metrics, such as achieving the target critical dimensions, avoiding damage to the etched materials, preventing defect formation, and ensuring the spatial uniformity of these performances
Reliability and dynamic properties of GaN high electron mobility transistors : backbarrier and substrate type impact
The rapid expansion of AI and cloud computing has placed unprecedented demands on data center infrastructure, where energy efficiency is now a defining constraint. Despite their potential, many power systems still rely on silicon-based devices, which suffer from inherent efficiency limitations that result in significant energy losses. GaN HEMTs, with their superior electron mobility and high breakdown voltage, represent a compelling alternative, capable of achieving far higher efficiencies in power conversion. However, their broader adoption is constrained by reliability challenges, particularly those arising from charge trapping mechanisms that degrade device performance over time.
In this PhD project, you will delve into the fundamental dynamics of charge carriers in GaN HEMTs, focusing on the physical origins of on-resistance and threshold voltage drifts—key indicators of device instability. By systematically analyzing the electrical behavior of these transistors under various operating conditions, you will uncover the mechanisms behind their degradation and identify pathways to enhance their robustness. Your findings will directly inform the optimization of device architectures, enabling the development of more efficient and reliable power electronics that can meet the demands of modern data centers and beyond.
You will be part of a multidisciplinary research team at CEA-Leti, collaborating with experts in semiconductor material engineering, device simulation, and electrical characterization. This environment will provide you with a comprehensive skill set, spanning process engineering, advanced electrical testing, and TCAD simulations, This position will not only expand your expertise but also position you at the forefront of a field with global impact. By contributing to the advancement of GaN HEMTs, you will play a key role in shaping the future of power electronics—where innovation directly translates into sustainable technological solutions.