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Thesis
Home   /   Thesis   /   Innovative dry etching process of exotic materials

Innovative dry etching process of exotic materials

Emerging materials and processes for nanotechnologies and microelectronics Technological challenges

Abstract

The advantageous properties (electro-optical, - acoustic, -mechanical) of new materials such as Sc-doped ALN, LNO, LTO or KNN make them essential to meet the development needs of integrated optics, RF telecommunication and microsystems. The production of patterns with submicron dimensions with a significant etch rate (>100nm/min), a vertical profile and a reduced roughness of the pattern's sidewalls are the main goals of the thesis work so as to satisfy the performance criteria of the devices targeted at the application level.

Laboratory

Département des Plateformes Technologiques (LETI)
Service des procédés de Patterning
Laboratoire Gravure
Université Grenoble Alpes
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