The fabrication of solar cells with high performances at a reduced cost is a key challenge addressed by many research institutions and industrials worldwide. Many technological solutions are being investigated. Among them, a promising approach consists in forming narrower metal lines to limit shadowing of active areas of the cells. This work aims at replacing serigraphy by new fabrication processes able to reduce line width. For this purpose, the conducting substrate is coated by an insulating mask in which the lines are defined. The metal is then directly plated selectively onto the weakly conducting portions of the substrate, i.e. the lines, using electrolytic reactions. The process conditions will be adapted with regard to the nature of the initial conducting surfaces.