About us
Espace utilisateur
Education
INSTN offers more than 40 diplomas from operator level to post-graduate degree level. 30% of our students are international students.
Professionnal development
Professionnal development
Find a training course
INSTN delivers off-the-self or tailor-made training courses to support the operational excellence of your talents.
Human capital solutions
At INSTN, we are committed to providing our partners with the best human capital solutions to develop and deliver safe & sustainable projects.
Thesis
Home   /   Post Doctorat   /   Study of the thermo-mechanical strains in the HEMT AlGaN/GaN on silicon

Study of the thermo-mechanical strains in the HEMT AlGaN/GaN on silicon

Electronics and microelectronics - Optoelectronics Engineering sciences

Abstract

Fabricating the HEMT AlGaN/GaN device is complex and leads to the formation of crystalline defects. These strains, in the GaN layer, leads to crackings in the GaN layer or leads to a delamination at the top interface. Moreover, these mechanical strains conjugated to thermal strains during device working, can lead to a degradation of the electrical performance of the device.
This heterogeneous assembly, involve a complex behaviour. The various materials used, react differently to the thermal-mechanical strains. The requested work is to study and to model the distortion of this structure, in order to evaluate the strains effects on the electrical performance on lateral and vertical devices.

Laboratory

Département Composants Silicium (LETI)
Service Intégrations et Technologies pour les conversions d'énergies
Laboratoire des composants de Puissance à Semiconducteur
Top envelopegraduation-hatlicensebookuserusersmap-markercalendar-fullbubblecrossmenuarrow-down