The CEA welcomes 1,600 doctoral PhD students to its laboratories each year.
Thesis
Home / Post Doctorat / Study of the thermo-mechanical strains in the HEMT AlGaN/GaN on silicon
Study of the thermo-mechanical strains in the HEMT AlGaN/GaN on silicon
Electronics and microelectronics - OptoelectronicsEngineering sciences
Abstract
Fabricating the HEMT AlGaN/GaN device is complex and leads to the formation of crystalline defects. These strains, in the GaN layer, leads to crackings in the GaN layer or leads to a delamination at the top interface. Moreover, these mechanical strains conjugated to thermal strains during device working, can lead to a degradation of the electrical performance of the device.
This heterogeneous assembly, involve a complex behaviour. The various materials used, react differently to the thermal-mechanical strains. The requested work is to study and to model the distortion of this structure, in order to evaluate the strains effects on the electrical performance on lateral and vertical devices.
Laboratory
Département Composants Silicium (LETI)
Service Intégrations et Technologies pour les conversions d'énergies
Laboratoire des composants de Puissance à Semiconducteur
Nous utilisons des cookies pour vous garantir la meilleure expérience sur notre site web. Si vous continuez à utiliser ce site, nous supposerons que vous en êtes satisfait.OKNonPolitique de confidentialité